Plasma Etching: Fundamentals and Applications
Hardback Published on: 28/05/1998
Price: £212.50
Synopsis
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Publisher information
- Publisher: Oxford University Press
- ISBN: 9780198562870
- Number of pages: 356
- Dimensions: 242 x 163 x 23 mm
- Weight: 743g
- Languages: English